Plasma Processes for Semiconductor Fabrication
(Part of the Cambridge Studies in Semiconductor Physics and Microelectronic Engineering Series)
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Book Overview
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then...
Format:Paperback
Language:English
ISBN:0521018005
ISBN13:9780521018005
Release Date:September 2005
Publisher:Cambridge University Press
Length:232 Pages
Weight:0.90 lbs.
Dimensions:0.5" x 7.0" x 10.0"
Customer Reviews
1 rating
Excellent resource for plasma physics
Published by Thriftbooks.com User , 24 years ago
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.
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