Plasma Processes for Semiconductor Fabrication
(Part of the Cambridge Studies in Semiconductor Physics and Microelectronic Engineering Series)
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Book Overview
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.
Format:Hardcover
Language:English
ISBN:0521591759
ISBN13:9780521591751
Release Date:January 1999
Publisher:Cambridge University Press
Length:232 Pages
Weight:1.45 lbs.
Dimensions:0.7" x 7.1" x 10.2"
Customer Reviews
1 rating
Excellent resource for plasma physics
Published by Thriftbooks.com User , 24 years ago
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.
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